MICROPLASMA ION SOURCE FOR FOCUSED ION BEAM APPLICATIONS

摘要

The present invention provides a method of obtaining a bright source of ions with narrow energy spread for focused ion beam applications using micro plasmas. As a preferred embodiment, a high pressure microplasma source operating in a normal glow discharge regime is used to produce a cold bright focused beam of Xe⁺ and/or Xe₂⁺ ions having an ion temperature of the order of 0.5 -1 eV and a current density on the order of 0.1 -1 A/cm² or higher.