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Microplasma ion source for focused ion beam applications
Microplasma ion source for focused ion beam applications
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机译:聚焦离子束应用的微等离子体离子源
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摘要
The present invention provides a method of obtaining a bright source of ions with narrow energy spread for focused ion beam applications using micro plasmas. As a preferred embodiment, a high pressure microplasma source operating in a normal glow discharge regime is used to produce a cold bright focused beam of Xe+ and/or Xe2+ ions having ion temperature of the order of 0.5-1 eV and a current density on the order of 0.1-1 A/cm2 or higher.
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机译:本发明提供一种使用微等离子体获得用于聚焦离子束应用的具有窄能量散布的明亮离子源的方法。作为优选的实施方案,使用在正常辉光放电状态下运行的高压微等离子体源产生Xe + Sup>和/或Xe 2 Sub> + Sup>离子,离子温度为0.5-1 eV量级,电流密度为0.1-1 A / cm 2 Sup>或更高。
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