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Vapor deposition apparatus of a material sublimated and corresponding method for continuous deposition of a thin film layer on a substrate
Vapor deposition apparatus of a material sublimated and corresponding method for continuous deposition of a thin film layer on a substrate
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机译:升华材料的气相沉积设备以及在基板上连续沉积薄膜层的方法
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摘要
An apparatus (100) for vapor deposition of sublimated source material as a películadelgada on a substrate (14) of a photovoltaic (PV) module, the apparatus comprising: a head (110) deposition; a receptacle (116) disposed in said head (119) deposition, being configured dichoreceptáculo (116) for receipt of a granular source material; a manifold heated (124) distribution disposed below said receptacle (116), I configuradodicho heated manifold (124) distribution to heat said receptacle (116) to a gradosuficiente as to sublimate source material within said receptacle (116); and a plate (152) distribution comprising greater than about 75% by weight of molibdenodispuesta below said manifold (152) distribution and a defined distance above a planohorizontal transport an upper surface of a substrate (14 ) transported through dichoaparato (100), said distribution plate (152) a pattern of passages therethrough quedistribuyen also the sublimated source material passing through said manifold (152) distribution.
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