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Vapor deposition apparatus of a material sublimated and corresponding method for continuous deposition of a thin film layer on a substrate

机译:升华材料的气相沉积设备以及在基板上连续沉积薄膜层的方法

摘要

An apparatus (100) for vapor deposition of sublimated source material as a películadelgada on a substrate (14) of a photovoltaic (PV) module, the apparatus comprising: a head (110) deposition; a receptacle (116) disposed in said head (119) deposition, being configured dichoreceptáculo (116) for receipt of a granular source material; a manifold heated (124) distribution disposed below said receptacle (116), I configuradodicho heated manifold (124) distribution to heat said receptacle (116) to a gradosuficiente as to sublimate source material within said receptacle (116); and a plate (152) distribution comprising greater than about 75% by weight of molibdenodispuesta below said manifold (152) distribution and a defined distance above a planohorizontal transport an upper surface of a substrate (14 ) transported through dichoaparato (100), said distribution plate (152) a pattern of passages therethrough quedistribuyen also the sublimated source material passing through said manifold (152) distribution.
机译:一种用于在光伏(PV)模块的衬底(14)上气相沉积升华的源材料(如peladeculadelgada)的设备(100),该设备包括:头(110)沉积;接收器(116),其设置在所述头部(119)中,被配置为用于接收粒状原料的二等分(116);设置在所述容器(116)下方的加热的歧管(124)分布,构造成加热的歧管(124)分布,以将所述容器(116)加热至足以使所述容器(116)内的原料升华。板(152)分布包括在所述歧管(152)分布下方大于按重量计约75%的molibdenodispuesta,以及在平面角向上方传输限定距离的衬底(14)的上表面,该基片(14)被运输通过百叶草(100)。板(152)中穿过的通道的图案也分布通过所述歧管(152)分布的升华的原料。

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