首页> 外国专利> TRANSPARENT RECTIFYING METAL/METAL OXIDE/SEMICONDUCTOR CONTACT STRUCTURE AND METHOD FOR THE PRODUCTION THEREOF AND USE

TRANSPARENT RECTIFYING METAL/METAL OXIDE/SEMICONDUCTOR CONTACT STRUCTURE AND METHOD FOR THE PRODUCTION THEREOF AND USE

机译:透明整流的金属/金属氧化物/半导电接触结构及其制造和使用方法

摘要

The invention relates to transparent rectifying contact structures forapplication inelectronic devices, in particular appertaining to optoelectronics, solartechnologyand sensor technology, and also a method for the production thereof. Thetransparent rectifying contact structure according to the invention has thefollowingconstituents: a) a transparent semiconductor, b) a transparent, non-insulatingandnon-conducting layer composed of metal oxide, metal sulphide and/or metalnitride,the resistivity of which is preferably in the range of 10 2 .OMEGA.cm to 10 7.OMEGA.cm and c) alayer composed of a transparent electrical conductor wherein the layer b) isformedbetween the semiconductor a) and the layer c) and the composition of the layerb)is defined in greater detail in the description of the patent.
机译:本发明涉及一种透明整流接触结构,用于应用在电子设备,特别是光电子,太阳能设备技术传感器技术及其生产方法。的根据本发明的透明整流接触结构具有以下成分:a)透明半导体,b)透明,非绝缘和由金属氧化物,金属硫化物和/或金属组成的非导电层氮化物电阻率优选在10 2Ωcm至10 7范围内.OMEGA.cm和c)a由透明电导体组成的层,其中b)层为形成的在半导体a)和层c)之间以及该层的组成b)在专利说明中更详细地定义。

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