首页> 外国专利> TRANSPARENT RECTIFYING METAL/METAL OXIDE/SEMICONDUCTOR CONTACT STRUCTURE AND METHOD FOR THE PRODUCTION THEREOF AND USE

TRANSPARENT RECTIFYING METAL/METAL OXIDE/SEMICONDUCTOR CONTACT STRUCTURE AND METHOD FOR THE PRODUCTION THEREOF AND USE

机译:透明整流的金属/金属氧化物/半导电接触结构及其制造和使用方法

摘要

The present invention relates, in particular, to transparent rectifying contact structures and methods for their manufacture, which are applied to electronic devices in the optoelectronics, solar thermal and sensor arts. The transparent rectifying contact structure according to the present invention has the following structure. a) a transparent semiconductor, b) a transparent non-insulating and non-conductive layer of metal oxides, metal sulfides and / or metal nitrides, wherein the resistivity of the layer is preferably in the range of 10 2 Ωcm to 10 7 Ωcm, and c) transparent A layer of an electrical conductor, wherein the layer b) is formed between the semiconductor a) and the layer c), and the configuration of the layer b) is specifically defined in the detailed description of the present invention.
机译:本发明尤其涉及透明整流接触结构及其制造方法,其应用于光电子学,太阳热学和传感器领域的电子设备。根据本发明的透明整流接触结构具有以下结构。 a)透明半导体,b)金属氧化物,金属硫化物和/或金属氮化物的透明非绝缘非导电层,其中该层的电阻率优选在10 2 Ωcm至10 7 Ωcm,并且c)透明的电导体层,其中b)层形成在半导体a)和c)层之间,并且b层的结构在本发明的详细描述中具体定义了)。

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