首页> 外国专利> SYSTEMS FOR AND METHODS OF CONTROLLING TIME-MULTIPLEXED DEEP REACTIVE-ION ETCHING PROCESSES

SYSTEMS FOR AND METHODS OF CONTROLLING TIME-MULTIPLEXED DEEP REACTIVE-ION ETCHING PROCESSES

机译:时间多重深度反应离子刻蚀过程的控制系统和方法

摘要

An improved gas delivery system and method delivers a sequence of pulses of prescribed amounts of at least two gases to a process chamber of a process tool in accordance with a predetermined recipe of steps of a gas delivery process. The system comprises: a plurality of channels, each including a control valve connected so as to control each pulse of gas flowing through the corresponding channel into the process chamber of the process tool; and an exhaust valve for controlling the pressure within the process chamber, the exhaust valve including a valve controller for controlling the operation of the gas delivery system including the control valves and the exhaust valve in accordance with the predetermined recipe of steps. In one embodiment, the exhaust valve controller is configured to operate in a hybrid feedback mode including both open feedback loop control wherein the exhaust valve is set at a preselected position based on a past learned position for each step of the gas delivery process, and closed feedback loop control of the system for each step of the gas delivery process as a function of the pressure within the process chamber following the open loop control.
机译:一种改进的气体输送系统和方法,根据气体输送过程的步骤的预定配方,将一系列规定量的至少两种气体的脉冲序列输送到处理工具的处理室。该系统包括:多个通道,每个通道包括被连接的控制阀,以控制流过相应通道进入处理工具的处理室的气体的每个脉冲;所述排气阀包括阀控制器,所述阀控制器用于根据预定步骤的配方控制包括所述控制阀和排气阀的气体输送系统的操作。在一个实施例中,排气门控制器被配置为在混合反馈模式下操作,该混合反馈模式包括开环反馈回路控制,其中排气门基于气体输送过程的每个步骤的过去学习位置被设置在预选位置,并且被关闭。在开环控制之后,针对气体输送过程的每个步骤,对系统的反馈回路进行控制,作为处理室内压力的函数。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号