NITRIDE SEMICONDUCTOR FABRICATION DEVICE MATERIAL WASHING METHOD AND NITRIDE SEMICONDUCTOR FABRICATION DEVICE MATERIAL WASHING DEVICE

摘要

Provided is a method of washing, among materials which configure a nitride semiconductor fabrication device, a nitride semiconductor fabrication device material (13) including nitride semiconductors to which deposits have adhered, said method comprising: a step of chemical processing the nitride semiconductor fabrication device material with a washing gas including chlorinated gas; and a step of blowing a sublimating solid substance and removing the deposits from the nitride semiconductor fabrication device material (13).