NITRIDE SEMICONDUCTOR FABRICATION DEVICE MATERIAL WASHING METHOD AND NITRIDE SEMICONDUCTOR FABRICATION DEVICE MATERIAL WASHING DEVICE

摘要

A method for cleaning a component of a nitride semiconductor manufacturing apparatus to which has adhered deposits containing nitride semiconductor comprises a step for chemically treating the component of the nitride semiconductor manufacturing apparatus with a cleaning gas containing a chlorine-based gas, and a step for removing the deposits from the component of the nitride semiconductor manufacturing apparatus by spraying with a sublimable solid substance.