BAFFLE FOR IMPROVING AN ASHING RATE USING PLASMA AND A SUBSTRATE PROCESSING DEVICE USING THE SAME

摘要

PURPOSE: A baffle and a substrate processing device including the same are provided to prevent the thermal deformation of the baffle by distributing thermal stress in the baffle.;CONSTITUTION: A plasma generating unit(300) generates plasma. A housing(110) has a space inside. The housing is located on the lower side of the plasma generating unit. A susceptor(121) is located in the housing. Spray holes spray plasma from the plasma generating unit to the substrate.;COPYRIGHT KIPO 2013