BAFFLE PLATE AND A SUBSTRATE PROCESSING DEVICE, IMPROVING UNIFORMITY OF A SUBSTRATE PROCESS

摘要

PURPOSE: A baffle plate and a substrate processing device are provided to prevent the lowering of a process speed in a circumference of a semiconductor wafer by controlling a process state of a peripheral part of the semiconductor wafer.;CONSTITUTION: A baffle plate(5) is arranged around a substrate mounting table(3) in a process chamber(2). The baffle plate has a plurality of exhaust holes. The gas is exhausted from the process chamber through a plurality of exhaust holes. The baffle plate has a stack structure of the plurality of plate-shaped units. The baffle plate has the supply path of the pressure control gas for controlling the pressure inside the process chamber. The pressure control gas is the argon gas or nitrogen gas.;COPYRIGHT KIPO 2010