GAS SPRAY DEVICE WITH AN IMPROVED STRUCTURE TO UNIFORMLY SUPPLY GAS TO THE ENTIRE AREA OF A SUBSTRATE AND A SUBSTRATE PROCESSING DEVICE USING THE SAME

摘要

PURPOSE: A gas supplying device and a substrate processing device using the same are provided to uniformly supply gas to the entire area of a substrate by increasing the size and arrangement density of gas spray holes toward the outside of a substrate support unit.;CONSTITUTION: A space unit(11) is formed in a chamber(10). A substrate support unit(20) includes a support plate(21) and a rotation shaft(22). A gas spray device sprays process gas to a plurality of substrates received in the substrate support unit and includes a plurality of gas spray units. The gas spray unit is comprised of a top plate(50), a middle plate(60), and a spray plate(70).;COPYRIGHT KIPO 2011