首页> 外国专利> NONVOLATILE POLYMER MEMORY DEVICE INCLUDING A BUFFER LAYER AND A MANUFACTURING METHOD THEREOF CAPABLE OF MAINTAINING HIGH MEMORY MARGIN OF A PEDOT:PSS MEMORY DEVICE

NONVOLATILE POLYMER MEMORY DEVICE INCLUDING A BUFFER LAYER AND A MANUFACTURING METHOD THEREOF CAPABLE OF MAINTAINING HIGH MEMORY MARGIN OF A PEDOT:PSS MEMORY DEVICE

机译:包括缓冲层的非易失性聚合物存储器件及其制造方法,该器件能够保持PedOT:PSS存储器的高存储容限

摘要

PURPOSE: A nonvolatile polymer memory device including a buffer layer and a manufacturing method thereof are provided to prevent an oxide layer between a bottom electrode and a PEDOT:PSS thin film layer by inserting the buffer layer between the bottom electrode and the PEDOT:PSS thin film layer.;CONSTITUTION: A bottom electrode(20) is formed on a substrate(10). A buffer layer(30) is formed on the bottom electrode. A PEDOT:PSS thin film layer(40) is formed on the buffer layer. A top electrode(50) is formed on the PEDOT:PSS thin film layer. The buffer layer is made of one or more mixtures selected among PMMA, PI, PVP, PS, and PE groups.;COPYRIGHT KIPO 2013
机译:目的:提供一种包括缓冲层的非易失性聚合物存储器件及其制造方法,以通过将缓冲层插入底部电极和PEDOT:PSS之间来防止底部电极和PEDOT:PSS薄膜之间形成氧化物层组成:底部电极(20)形成在基板(10)上。在底部电极上形成缓冲层(30)。在缓冲层上形成PEDOT:PSS薄膜层(40)。在PEDOT:PSS薄膜层上形成顶部电极(50)。缓冲层由一种或多种选自PMMA,PI,PVP,PS和PE组的混合物制成。; COPYRIGHT KIPO 2013

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