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THIN FILM TRANSISTOR ARRAY DEVICE, ORGANIC EL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR ARRAY DEVICE

机译:薄膜晶体管阵列装置,有机EL显示装置以及制造薄膜晶体管阵列装置的方法

摘要

thin film transistor array device 100 is configured by the first crystal grains of a first average grain size TFT (10a) and a drive having a crystalline semiconductor film (5a), for a switch having a second crystalline semiconductor film (5b) is configured by a first average grain having an average grain size is smaller than the second average grain size, grain size and a TFT (10b). A first crystalline semiconductor film (5a) and the second crystalline semiconductor film (5b) is, using a laser having a light intensity distribution of a Gaussian distribution of amorphous non-crystalline semiconductor film such that the temperature is in the range of 600 to 1100 a semiconductor film formed by laser irradiation, the first crystalline semiconductor film (5a) is formed to ensure that the temperature range of 1100 to 1414 by the latent heat by laser irradiation. A second crystalline semiconductor film (5b) is formed at the same time as the formation of the first crystalline semiconductor film (5a),. ;
机译:薄膜晶体管阵列器件100由第一平均粒径TFT的第一晶粒(10a)和具有晶体半导体膜(5a)的驱动器构成,用于具有第二晶体半导体膜(5b)的开关由具有平均晶粒尺寸的第一平均晶粒小于第二平均晶粒尺寸,晶粒尺寸和TFT(10b)。第一晶体半导体膜(5a)和第二晶体半导体膜(5b)使用具有非晶态非晶态半导体膜的高斯分布的光强度分布,使得温度在600℃至1100℃的范围内的激光器。在通过激光辐照形成的半导体膜中,形成第一晶体半导体膜(5a)以确保通过激光辐照产生的潜热的温度范围为1100至1414。在形成第一晶体半导体膜(5a)的同时形成第二晶体半导体膜(5b)。 ;

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