METHOD OF MANUFACTURING A HIGH DENSITY TARGET UTILIZING WASTE TARGETS CONSISTING OF A ZINC OXIDE, A GALLIUM OXIDE, AND AN INDIUM OXIDE, CAPABLE OF APPLYING ONLY A DRY PROCESS

摘要

PURPOSE: A method of manufacturing a high density target utilizing waste targets consisting of a zinc oxide, a gallium oxide, and an indium oxide is provided to manufacture a high density sputtering target with a high yield by applying only a dry process without a wet dissolution processing.;CONSTITUTION: A method of manufacturing a high density target utilizing waste targets consisting of a zinc oxide, a gallium oxide, and an indium oxide comprises the following steps: a waste target consisting of an indium oxide, a gallium oxide, and a zinc oxide is heated with a temperature more than 900°C; an organization is softening by processing the heated target with a quick freezing; after the quick freezing target is coarse grinding, the coarse grinding target is fine grinding; the fine grounding powder is sieved, and the sieved powder is processed with a beads mill; in a beads mill processing, a sintering aid is added and mixed, and the mixed slurry is reduced to a granulation powder; and the granulation powder is made into a molding product, and the molding product is sintering.;COPYRIGHT KIPO 2013