COMPLEX POLISHING SYSTEM SUPPLYING POLISHING SLURRY MIXING AN ELECTROLYTE IN A NON-MIXING METHOD

摘要

PURPOSE: A complex polishing system is provided to polish the surface of high hardness conductivity materials and to secure high quality surface polishing performance because polishing slurry mixing magneto-rheological (MR) fluid and an electrolyte is used.;CONSTITUTION: A complex polishing system comprises a wheel member (100), a magnetic field supply member, a MR fluid supply member (400), an abrasive material supply member (500), an abrasive separating unit (600), a shape maintaining unit (700), and a power supply member (800). The abrasive material supply member supplies an abrasive material in which an electrolyte and polishing slurry are mixed to the surface of MR fluid. The abrasive separating unit separates the abrasive material from the wheel member. The shape maintaining unit is arranged to contact the wheel member and maintains a shape of outer surface of the MR fluid to a predetermined shape. The power supply member applies a positive current to a workpiece and a negative current to the abrasive material supply member.;COPYRIGHT KIPO 2013