SPUTTERING TARGET FOR FORMING Ag ALLOY FILM, Ag ALLOY FILM, Ag ALLOY REFLECTION FILM, Ag ALLOY CONDUCTIVE FILM, AND Ag ALLOY SEMITRANSPARENT FILM

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target for allowing forming an Ag alloy film which has excellent optical properties such as reflectivity or transmittance, has a low specific resistance, and is superior in various resistant properties such as heat resistance and environmental resistance, of which reflectivity does not change much even after heat treatment, and of which optical properties such as reflectivity or transmittance and the specific resistance do not change much under a use environment.;SOLUTION: A sputtering target for forming an Ag alloy film according to the invention has a composition of 0.2 atomic% or more and 2.0 atomic% or less of Sb, and 0.05 atomic% or more and 1.00 atomic% or less of Mg, with the balance being Ag and inevitable impurities.;COPYRIGHT: (C)2014,JPO&INPIT