Abstract: The transition temperature $tau$-c$/ of the V$-1$MIN@x$/W$-x$/O$-2$/ films deposited by dual-target sputtering was precisely determined from the changes both in IR transmittance and in electrical resistivity against temperature. The relationship between x (0-0.026) in V$- 1$MIN@x$/W$-x$/O$-2$/ and $tau$-c$/(0-67$DGR@C) in the most applicable range for window coatings was clarified and a $tau$-c$/ reduction efficiency of 23$DGR@C/at.%W was again confirmed. The V$-1$MIN@x$/W$-x$/O$-2$/ films containing the desired tungsten doping amount were fabricated with reproducibility by sputtering of a V-W(1.6at.%) alloy target under optimal conditions. The $tau$-c$/ reduction efficiency for the films deposited using alloy target is almost identical of that for the films deposited by dual-target sputtering. The V$-1$MIN@x$/W$-x$/O$-2$/ films deposited using alloy target showed thermochroism comparative to those previously prepared by dual-target sputtering. !14
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机译：摘要：根据两个目标的变化，精确确定了双靶溅射沉积的V $ -1 $ MIN @ x $ / W $ -x $ / O $ -2 $ /薄膜的转变温度tau $ -c $ /在红外透射率和对温度的电阻率方面。 V $ -1 $ MIN @ x $ / W $ -x $ / O $ -2 $ /中的x（0-0.026）和$ tau $ -c $ /（0-67 $ DGR @ C）中的关系明确了窗户涂料的最适用范围，并再次确认了$ tau $ -c $ /的降低效率为23$DGR@C/at.%W。通过在最佳条件下溅射VW（1.6at。％）合金靶，可再现性地制作包含所需钨掺杂量的V $ -1 $ MIN @ x $ / W $ -x $ / O $ -2 $ /膜。 。使用合金靶沉积的薄膜的tau-c $ /还原效率几乎与通过双靶溅射沉积的薄膜的tau-c $ /还原效率相同。与先前通过双靶溅射制备的薄膜相比，使用合金靶沉积的V $ -1 $ MIN @ x $ / W $ -x $ / O $ -2 $ /膜显示出热致变色。 ！14
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