首页> 外国专利> CARRIER-FITTED COPPER FOIL, METHOD FOR MANUFACTURING CARRIER-FITTED COPPER FOIL, PRINTED WIRING BOARD, PRINTED CIRCUIT BOARD, COPPER-CLAD LAMINATE SHEET, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD

CARRIER-FITTED COPPER FOIL, METHOD FOR MANUFACTURING CARRIER-FITTED COPPER FOIL, PRINTED WIRING BOARD, PRINTED CIRCUIT BOARD, COPPER-CLAD LAMINATE SHEET, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD

机译:载有载体的铜箔,制造载有载体的铜箔的方法,印刷线路板,印刷电路板,覆铜箔层压板以及制造印刷线路板的方法

摘要

PROBLEM TO BE SOLVED: To provide a carrier-fitted copper foil exhibiting a high adhesion force between a carrier and an ultrathin copper foil before a step of being laminated on an insulating substrate but easily peelable via the carrier-ultrathin copper foil interface after the laminating step and having a favorable ultrathin copper foil etchability.SOLUTION: A roughened layer of Rz=1.6 μm or less is formed on the ultrathin copper layer surface of the carrier-fitted copper foil. The intermediate layer thereof comprise Ni. In a case where, on an occasion for hot-pressing an insulating substrate onto the ultrathin copper layer under specified conditions and then peeling the ultrathin copper layer therefrom, the chromium atom concentration (%), its zinc counterpart (%), its nickel counterpart (%), its copper counterpart (%), its oxygen counterpart (%), its carbon counterpart (%), and its counterpart of others (%) along the depth direction ascertained as a result of X-ray photoelectron spectroscopic (XPS) surface analysis (x: unit nm) are defined respectively as e(x), f(x), g(x), h(x), i(x), j(x), and k(x), ∫g(x)dx/(∫e(x)dx+∫f(x)dx+∫g(x)dx+∫h(x)dx+∫i(x)dx+∫j(x)dx+∫k(x)dx) satisfies the condition of 20.0% or less within the zone [0, 1.0] of analysis along the direction of depth from the intermediate layer-side surface of the ultrathin copper layer.
机译:要解决的问题:提供一种在基片上绝缘的基板上层压之前在基片和超薄铜箔之间显示高粘合力但在层压后易于通过基片-超薄铜箔界面剥离的基片。解决方案:在载有载体的铜箔的超薄铜层表面上形成Rz =1.6μm或更小的粗糙层。其中间层包含Ni。在以下情况下,在规定条件下将绝缘基板热压至极薄铜层上,然后从其上剥离极薄铜层时,铬原子浓度(%),其锌对应物(%),其镍对应物X射线光电子能谱(XPS)确定的深度方向上的百分比(%),铜的对应部分(%),氧的对应部分(%),碳的对应部分(%)和其他的对应部分(%)表面分析(x:单位nm)分别定义为e(x),f(x),g(x),h(x),i(x),j(x)和k(x)。 g(x)dx /(∫ e(x)dx +∫ f(x)dx +∫ g(x)dx +∫ h(x)dx +∫ i(x)dx +∫ j (x)dx +∫ k(x)dx)沿着从超薄铜层的中间层侧表面开始的深度方向在分析区域[0、1.0]内满足20.0%以下的条件。

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