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TEMPORARY ADHESIVE FOR WAFER PROCESSING, MEMBER FOR WAFER PROCESSING USING THE SAME, WAFER PROCESSED BODY, AND METHOD FOR PRODUCING THIN WAFER
TEMPORARY ADHESIVE FOR WAFER PROCESSING, MEMBER FOR WAFER PROCESSING USING THE SAME, WAFER PROCESSED BODY, AND METHOD FOR PRODUCING THIN WAFER
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机译:晶圆加工的临时粘合剂,使用相同晶圆加工晶圆的成员,晶圆加工体以及生产薄晶圆的方法
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摘要
PROBLEM TO BE SOLVED: To provide a wafer processed body which has an appropriate separation force with a cleaning property after separation retained, a member for wafer processing, a temporary adhesive for wafer processing, and a method for producing a thin wafer using the same.SOLUTION: An embodiment comprises two layers of siloxane including: a first temporary adhesive layer, which is releasably bonded to a surface of a wafer and is a layer (A) of a thermoplastic resin modified organopolysiloxane obtained by partial dehydration condensation of an organopolysiloxane and an organopolysiloxane resin, where the organopolysiloxane resin contains a RRRSiOunit (R, Rand Reach represent a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms or a hydroxyl group) and a SiOunit with the molar ratio of the RRRSiOunit to the SiOunit in the range from 0.6 to 1.7; and a second temporary adhesive layer, which is laminated on the first temporary adhesive layer and releasably bonded to the support and is a thermosetting modified siloxane polymer layer (B).
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