首页> 外国专利> Temporary adhesive for wafer processing, wafer processing member using the same, wafer processed body, and method for producing thin wafer

Temporary adhesive for wafer processing, wafer processing member using the same, wafer processed body, and method for producing thin wafer

机译:用于晶片处理的临时粘合剂,使用该粘合剂的晶片处理构件,晶片处理体以及用于生产薄晶片的方法

摘要

The present invention provided is the temporary adhesive for wafer processing which temporarily bonds a wafer having a circuit face on the front surface and a processing face on the back surface to a support, and includes a first temporary adhesive layer which is a layer (A) of a thermoplastic resin modified organopolysiloxane obtained by partial dehydration condensation of an organopolysiloxane resin containing a R21R22R23SiO1/2, and a SiO4/2 unit in a molar ratio of R21R22R23SiO1/2 unit/SiO4/2 unit of 0.6 to 1.7 and an organopolysiloxane represented by the following general formula (1), and a second temporary adhesive layer which is a thermosetting modified siloxane polymer layer (B) which is laminated on the first temporary adhesive layer and is releasably bonded to the support.
机译:本发明提供了一种用于晶片处理的临时粘合剂,其将具有在前表面上的电路面和在后表面上的处理面的晶片临时粘合到支撑体,并且包括作为层(A)的第一临时粘合剂层。热塑性树脂改性的有机聚硅氧烷的制备,该有机聚硅氧烷是通过将R21R22R23SiO1 / 2单元/ SiO4 / 2单元的摩尔比为0.6至1.7的含有R21R22R23SiO1 / 2和SiO4 / 2单元的有机聚硅氧烷树脂与有机聚硅氧烷部分脱水缩合而得到的下述通式(1),和第二临时粘合剂层,其是热固性改性的硅氧烷聚合物层(B),其层压在第一临时粘合剂层上并且可释放地结合到载体上。

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