首页> 外国专利> PULSED LASER CHEMICAL VAPOR DEPOSITION AND SURFACE MODIFICATION

PULSED LASER CHEMICAL VAPOR DEPOSITION AND SURFACE MODIFICATION

机译:脉冲激光化学气相沉积和表面改性

摘要

An ultra-short pulse laser physically and/or chemically modifies a substrate surface. A laser ablation process is configured to form raised surface features on the substrate. The laser also functions as the energy source in a chemical vapor deposition (CVD) process. The laser delivers energy to the substrate with parameters such as pulse energy, size, duration, and spacing sufficient to simultaneously vaporize substrate material and cause the substrate material to react with a controlled environment that includes constituents of a desired coating composition. A battery electrode having a face with microneedle features coated with an active metal compound can be produced by the process. The active metal compound is a lithium-containing compound in a lithium-ion battery.
机译:超短脉冲激光在物理和/或化学上修饰衬底表面。激光烧蚀工艺被配置为在基板上形成凸起的表面特征。激光在化学气相沉积(CVD)过程中还充当能源。激光以诸如脉冲能量,大小,持续时间和间隔之类的参数将能量传递到基板,该参数足以同时蒸发基板材料并使基板材料与包括所需涂料组合物的成分的受控环境反应。可以通过该方法来制造具有带有微针特征的表面的,涂覆有活性金属化合物的电池电极。活性金属化合物是锂离子电池中的含锂化合物。

著录项

  • 公开/公告号US2014308587A1

    专利类型

  • 公开/公告日2014-10-16

    原文格式PDF

  • 申请/专利权人 THE REGENTS OF THE UNIVERSITY OF MICHIGAN;

    申请/专利号US201414251928

  • 发明设计人 JYOTIRMOY MAZUMDER;

    申请日2014-04-14

  • 分类号H01M4/78;H01M4/04;H01M4/1395;

  • 国家 US

  • 入库时间 2022-08-21 16:09:51

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号