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Application of Pulsed-Uv Laser Raman Spectroscopy to Chemical Vapor Deposition

机译：脉冲紫外激光拉曼光谱在化学气相沉积中的应用

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Raman detection limits obtained with a KrF laser excitation source were comparable to those obtained by laser-induced fluorescence and photofragment emission spectroscopy under chemical vapor deposition conditions. (ERA citation 06:019436)

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Hargis, P. J.;
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年度 1981
页码 1-5
总页数 5
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Chemical vapor deposition; Raman spectra; Diagnostic techniques; Diagnostic uses; Fluorescence; Gas lasers; Laser radiation; Limiting values; Ultraviolet radiation;

机译：化学气相沉积;拉曼光谱;诊断技术;诊断用途;荧光;气体激光;激光辐射;极限值;紫外线辐射;

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8. Laser-Heated CVD (Chemical Vapor Deposition) Process for Depositing Thin Films for Low-Cost Solar-Cell Applications: Final Subcontract Report, 1 February 1984-28 February 1987 [R] . Adler, D. , Haggerty, J. S. 1988

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Application of Pulsed-Uv Laser Raman Spectroscopy to Chemical Vapor Deposition

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