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Fabrication of Superhydrophobic Surfaces on Aluminum Alloy Via Electrodeposition of Copper Followed by Electrochemical Modification

机译:电沉积铜并随后进行电化学改性,从而在铝合金上制备超疏水表面

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摘要

Superhydrophobic aluminum surfaces have been prepared by means of electrodeposition of copper on aluminum surfaces, followed by electrochemical modification using stearic acid organic molecules. Scanning electron microscopy(SEM) images show that the electrodeposited copper films follow 'island growth mode' in the form of microdots and their number densities increase with the rise of the negative deposition potentials. At an electrodeposition potential of-0.2 V the number density of the copper microdots are found to be 4.5×104cm-2that are increased to 2.9×105cm-2at a potential of-0.8 V. Systematically, the distances between the microdots are found to be reduced from 26.6 μm to 11.03 μm with the increase of negative electrochemical potential from-0.2 V to-0.8 V. X-ray diffraction(XRD) analyses have confirmed the formation of copper stearate on the stearic acid modified copper films. The roughness of the stearic acid modified electrodeposited copper films is found to increase with the increase in the density of the copper microdots. A critical copper deposition potential of-0.6 V in conjunction with the stearic acid modification provides a surface roughness of 6.2 μm with a water contact angle of 157?, resulting in superhydrophobic properties on the aluminum substrates.
机译:通过在铝表面上电沉积铜,然后使用硬脂酸有机分子进行电化学改性,可以制备超疏水铝表面。扫描电子显微镜(SEM)图像显示,电沉积的铜膜以微点的形式遵循“岛生长模式”,并且其数目密度随着负沉积电位的升高而增加。在-0.2 V的电沉积电位下,发现铜微点的数量密度为4.5×104cm-2,在-0.8 V的电位下增加到2.9×105cm-2。系统地,发现微点之间的距离为随着负电化学电位从-0.2 V增加到-0.8 V,从26.​​6μm减小到11.03μm。X射线衍射(XRD)分析已证实在硬脂酸改性的铜膜上形成了硬脂酸铜。发现硬脂酸改性的电沉积铜膜的粗糙度随着铜微点密度的增加而增加。临界铜沉积电位为-0.6 V,加上硬脂酸改性,可提供6.2μm的表面粗糙度和157°的水接触角,从而在铝基板上产生超疏水性能。

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