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Semiconductor devices including bipolar transistors, CMOS transistors and DMOS transistors, and methods of manufacturing the same

机译:包括双极型晶体管,CMOS晶体管和DMOS晶体管的半导体器件及其制造方法

摘要

Semiconductor devices having a bipolar transistor, a CMOS transistor, a drain extension MOS transistor and a double diffused MOS transistor are provided. The semiconductor device includes a semiconductor substrate including a logic region in which a logic device is formed and a high voltage region in which a high power device is formed, trenches in the semiconductor substrate, isolation layers in respective ones of the trenches, and at least one field insulation layer disposed at a surface of the semiconductor substrate in the high voltage region. Related methods are also provided.
机译:提供了具有双极型晶体管,CMOS晶体管,漏极扩展MOS晶体管和双扩散MOS晶体管的半导体器件。该半导体器件包括:半导体衬底,其包括:逻辑区域,在该逻辑区域中形成有逻辑器件;以及高压区域,在该高压区域中形成有高功率器件;该半导体衬底中的沟槽;该沟槽中的各个沟槽中的隔离层;以及至少一个沟槽。一个场绝缘层设置在高压区域中的半导体衬底的表面上。还提供了相关方法。

著录项

  • 公开/公告号US8809991B2

    专利类型

  • 公开/公告日2014-08-19

    原文格式PDF

  • 申请/专利权人 SK HYNIX INC.;

    申请/专利号US201213707268

  • 发明设计人 SUNG KUN PARK;

    申请日2012-12-06

  • 分类号H01L21/8232;H01L27/088;

  • 国家 US

  • 入库时间 2022-08-21 16:05:32

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