Mold for UV assisted nanoimprint lithography and methods for making such a mold

摘要

A mold for nanoimprint lithography assisted by a determined wavelength is disclosed. According to some aspects, a layer made from a first material including, on a first face, a layer made from a second rigid material in which n structured zones with micrometric or nanometric patterns (n≧1) are made, and, on the face opposite said first face, a layer made from a third rigid material in which n recesses are formed, opposite the n structured zones. The n recesses are filled with a fourth material to form n portions. The transmittance at the determined wavelength of the layer of third material is lower than the transmittance of any one of the n portions; and the transmittance of the layers of first, second, and third materials at the determined wavelength λ_det is such that the transmission of a light with determined wavelength λ_det through said layers is lower than the transmission of the light through any one of the n portions and the layers of first and second materials. According to some aspects, methods for making such a mold are disclosed.