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MOLD FOR UV ASSISTED NANOIMPRINT LITHOGRAPHY AND METHODS FOR MAKING SUCH A MOLD
MOLD FOR UV ASSISTED NANOIMPRINT LITHOGRAPHY AND METHODS FOR MAKING SUCH A MOLD
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机译:用于紫外线辅助纳米压印术的模具及其制造方法
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摘要
A mold for nanoimprint lithography assisted by a determined wavelength is disclosed. According to some aspects, a layer made from a first material including, on a first face, a layer made from a second rigid material in which n structured zones with micrometric or nanometric patterns (n≧1) are made, and, on the face opposite said first face, a layer made from a third rigid material in which n recesses are formed, opposite the n structured zones. The n recesses are filled with a fourth material to form n portions. The transmittance at the determined wavelength of the layer of third material is lower than the transmittance of any one of the n portions; and the transmittance of the layers of first, second, and third materials at the determined wavelength λdet is such that the transmission of a light with determined wavelength λdet through said layers is lower than the transmission of the light through any one of the n portions and the layers of first and second materials. According to some aspects, methods for making such a mold are disclosed.
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机译:公开了由确定的波长辅助的用于纳米压印光刻的模具。根据一些方面,由第一材料制成的层在第一面上包括由第二刚性材料制成的层,在该第二刚性材料中制成具有微米或纳米图案(n≥1)的n个结构化区域,并且在该面上与所述第一面相对,由第三刚性材料制成的层,在其中形成有与n个结构化区域相对的n个凹槽。所述n个凹槽填充有第四材料以形成n个部分。第三材料层在确定的波长下的透射率低于n个部分中任何一个的透射率。第一,第二和第三材料层在确定的波长λ det Sub>下的透射率应使确定的波长为λ det Sub>的光穿过所述层低于通过n部分以及第一和第二材料层中的任何一个的光的透射率。根据一些方面,公开了用于制造这种模具的方法。
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