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High Selectivity, Low Damage Electron-Beam Delineation Etch
High Selectivity, Low Damage Electron-Beam Delineation Etch
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机译:高选择性,低损伤的电子束轮廓刻蚀
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摘要
A method and apparatus for selective etching a substrate using a focused beam. For example, multiple gases may be used that are involved in competing beam-induced and spontaneous reactions, with the result depending on the materials on the substrate. The gases may include, for example, an etchant gas and an auxiliary gas that inhibits etching.
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