首页> 外国专利> VERTICAL STACKING OF GRAPHENE IN A FIELD-EFFECT TRANSISTOR

VERTICAL STACKING OF GRAPHENE IN A FIELD-EFFECT TRANSISTOR

机译:场效应晶体管中石墨烯的垂直堆积

摘要

A graphene field-effect transistor is disclosed. The graphene field-effect transistor includes a first graphene sheet, a first gate layer coupled to the first graphene sheet and a second graphene sheet coupled to the first gate layer opposite the first gate layer. The first gate layer is configured to influence an electric field within the first graphene sheet as well as to influence an electric field of the second graphene sheet.
机译:公开了一种石墨烯场效应晶体管。石墨烯场效应晶体管包括第一石墨烯片,耦合到第一石墨烯片的第一栅极层和耦合到与第一栅极层相对的第一栅极层的第二石墨烯片。第一栅极层被配置为影响第一石墨烯片内的电场以及影响第二石墨烯片的电场。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号