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Influence of the density of states of graphene on the transport properties of graphene/MoS_2/metal vertical field-effect transistors

机译:石墨烯态密度对石墨烯/ MoS_2 /金属垂直场效应晶体管传输特性的影响

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摘要

We performed detailed studies of the current-voltage (I-V) characteristics in graphene/MoS_2/metal vertical field-effect transistors. Owing to its low density of states, the Fermi level in graphene is very sensitive to its carrier density and thus the external electric field. Under the application of a bias voltage V_B between graphene and the metal layer in the graphene/MoS_2/metal heterostructure for driving current through the van der Waals interface, the electric field across the MoS_2 dielectric induces a shift in the Fermi level of graphene. When the Fermi level of graphene coincides with the Dirac point, a significant nonlinearity appears in the measured I-V curve, thus enabling us to perform spectroscopy of the Dirac point. By detecting the Dirac point for different back-gate voltages, we revealed that the capacitance of the nanometer-thick MoS_2 layer can be determined from a simple DC transport measurement.
机译:我们对石墨烯/ MoS_2 /金属垂直场效应晶体管中的电流-电压(I-V)特性进行了详细研究。由于其状态密度低,石墨烯中的费米能级对其载流子密度和外部电场非常敏感。在石墨烯和石墨烯/ MoS_2 /金属异质结构中的金属层之间施加偏压V_B以驱动电流通过范德华斯界面时,跨MoS_2电介质的电场会引起石墨烯的费米能级移动。当石墨烯的费米能级与狄拉克点重合时,在测得的I-V曲线中会出现明显的非线性,从而使我们能够对狄拉克点进行光谱分析。通过检测不同背栅电压的狄拉克点,我们发现可以通过简单的直流传输测量来确定纳米级MoS_2层的电容。

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  • 来源
    《Applied Physics Letters》 |2015年第22期|223103.1-223103.5|共5页
  • 作者单位

    Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan;

    Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan;

    Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan;

    Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan;

    Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan;

    Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan,Institute for Nano Quantum Information Electronics, University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan;

    Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan,Institute for Nano Quantum Information Electronics, University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:15:10

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