Photoresist stripper composition and exfoliation method of a photoresist using the same

摘要

The present invention is a photoresist stripper composition comprising a euphonic acid compound, a phosphate compound and water and a stripping method using the same. When the semiconductor device and the flat panel display device are manufactured according to the present invention, photoresist that may occur in wet and dry processes can be easily removed by deposition and spray method, and the corrosion protection effect on the metal film and the oxide film is prevented. An excellent photoresist stripper composition and a stripping method using the same are provided.;Photoresist, Exfoliation, Corrosive, Euphonic Acid, Phosphoric Acid Compound