PHOTORESIST STRIPPER COMPOSITION, AND A EXFOLIATION METHOD OF PHOTORESIST USING THE SAME

摘要

The present invention is a photoresist stripper composition containing a compound (see the configuration of the invention) of formula (1) and it relates to a peeling method of the photoresist by. ; The present invention is a curing or deposition degenerated photoresist (polymeric) that occur during the wet or dry etching process, a spray, by a single wafer method or an air knife low temperature, can be easily peeled off in a short time, the metal wire is exposed to the stripping solution, in particular film quality excellent corrosion resistance to the metal substrate material and the inorganic layer is formed of a multi-junction structure comprising a copper, isobutane in a subsequent rinsing step propyl alcohol, dimethyl sulfoxide can be an organic solvent, such as rinsing with water only, without having to use, and the peeling method of the poorly biodegradable without addition of the compound that is environmentally friendly benzotriazole photoresist stripper composition and photoresist using the same provides.