首页> 外国专利> MANUFACTURING METHOD OF GALLIUM IRON OXIDE THIN FILM DOPED WITH METAL AND GALLIUM IRON OXIDE THIN FILM DOPED WITH METAL MANUFACTURED BY SAME

MANUFACTURING METHOD OF GALLIUM IRON OXIDE THIN FILM DOPED WITH METAL AND GALLIUM IRON OXIDE THIN FILM DOPED WITH METAL MANUFACTURED BY SAME

机译:金属掺杂的氧化镓铁薄膜的制造方法及金属掺杂的氧化镓铁薄膜的制造方法。

摘要

The present application relates to a manufacturing method of a gallium iron oxide thin film doped with a metal and a gallium iron oxide thin film doped by a metal manufactured by the method. The gallium iron oxide thin film doped with a metal of the present application can significantly reduce a leakage current generated from the gallium iron oxide thin film doped with a metal, and can adjust properties of a carrier at the same time. These results suggest a possibility of developing a new type of material that exhibits magnetization at room temperature and has adjustable carrying properties.;COPYRIGHT KIPO 2014
机译:本发明涉及一种掺杂有金属的氧化镓铁薄膜的制造方法以及通过该方法制造的由金属掺杂的氧化镓铁薄膜的制造方法。本申请的掺杂有金属的镓铁氧化物薄膜可以显着降低由掺杂有金属的镓铁氧化物薄膜产生的泄漏电流,并且可以同时调节载体的性能。这些结果表明,有可能开发出一种新型材料,该材料在室温下会表现出磁化强度并具有可调节的承载性能。; COPYRIGHT KIPO 2014

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