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Magnetic semiconductor substrate, manufacturing equipment manufacturing method and magnetic semiconductor substrate of the magnetic semiconductor substrate

机译:磁性半导体基板,制造设备的制造方法以及磁性半导体基板的磁性半导体基板

摘要

PROBLEM TO BE SOLVED: To provide a substrate for magnetic semiconductor, a manufacturing method for the same and a manufacturing apparatus for the same that can shorten the introduction time of magnetic atoms to a substrate and can provide a magnetic semiconductor usable even at room temperature.SOLUTION: A substrate for magnetic semiconductor comprises: a diffusion receiving layer 103 of semiconductor in which a thin film of magnetic atoms is formed on the irradiation surface to be irradiated by laser; and a thermal conduction suppressing layer 102 which is in contact with a surface opposite to the irradiation surface of the diffusion receiving layer and that has thermal conductivity lower than that of the diffusion receiving layer.
机译:解决的问题:为了提供用于磁性半导体的基板,其制造方法和用于其的制造设备,其可以缩短磁性原子向基板的引入时间并且可以提供即使在室温下也可用的磁性半导体。解决方案:磁性半导体衬底包括:半导体的扩散接收层103,其中在被激光照射的照射表面上形成磁性原子的薄膜;导热抑制层102,其与扩散接收层的与照射面相反的表面接触,并且具有比扩散接收层的导热率低的导热率。

著录项

  • 公开/公告号JP5742119B2

    专利类型

  • 公开/公告日2015-07-01

    原文格式PDF

  • 申请/专利权人 株式会社IHI;

    申请/专利号JP20100136256

  • 发明设计人 河口 紀仁;

    申请日2010-06-15

  • 分类号H01F1/40;H01L21/22;H01L29/82;

  • 国家 JP

  • 入库时间 2022-08-21 15:29:19

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