首页>
外国专利>
Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs
Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs
展开▼
机译:在化学机械平坦化(CMP)焊盘中产生原位凹槽的方法以及新颖的CMP焊盘设计
展开▼
页面导航
摘要
著录项
相似文献
摘要
Methods for producing in-situ grooves in CMP pads are provided. In general, the methods for producing in-situ grooves comprise the steps of patterning a silicone lining, placing the silicone lining in, or on, a mold, adding CMP pad material to the silicone lining, and allowing the CMP pad to solidify. CMP pads comprising novel groove designs are also described. For example, described here are CMP pads comprising concentric circular grooves and axially curved grooves, reverse logarithmic grooves, overlapping circular grooves, lassajous groves, double spiral grooves, and multiply overlapping axially curved grooves. The CMP pads may be made from polyurethane, and the grooves produced therein may be made by a method from the group consisting of silicone lining, laser writing, water jet cutting, 3-D printing, thermoforming, vacuum forming, micro-contact printing, hot stamping, and mixtures thereof.
展开▼