CHEMISTRY COMPATIBLE COATING MATERIAL FOR ADVANCED DEVICE ON-WAFER PARTICLE PERFORMANCE

摘要

In order to produce a coating on the article for a semiconductor processing chamber, the article comprises a ceramic coating on the at least one body of Al, Al ₂ O _3, or SiC, and body. The ceramic coating may comprise from about 50 mol% to about 75 mol% Y ₂ O ₃ , from about 10 mol% to about 30 mol% ZrO ₂ , and from about 10 mol% to about 30 mol% Al ₂ O ₃ Wherein the number of nodules per inch ranges from about 30 nodules to about 45 nodules and the porosity ranges from about 2.5% to about 3.2%.