CLEANING GAS SUPPLY APPARATUS FOR CLEANING WAFER CHAMBER AND LED, AND DRIVING METHOD OF THE SAME

摘要

Disclosed are an apparatus for supplying cleaning mixture gas for cleaning used in cleaning a light emitting device (LED) and a semiconductor wafer chamber, and a method of driving the same. An apparatus for supplying cleaning mixture gas for cleaning used in cleaning the LED and a semiconductor wafer chamber comprises; a housing (110); a gas mixture member (120) provided in the housing (110) to receive nitrogen gas and chlorine gas injected from the outside, to supply the cleaning mixture gas having the nitrogen gas and the chlorine gas mixed at a preset mixture ratio by adjusting an amount of introduced chlorine gas according to an amount of introduced nitrogen gas; a control unit (130) provided in the housing (110) to output a control signal, which is used to control the pressure and the flow rate of the nitrogen gas and the chlorine gas supplied into the gas mixture member (120), to the gas mixture member (120); and a display unit (140) provided one surface of the housing (110) to display information on the status of the gas mixture member (120) output from the control unit (130). The cleaning mixture gas contains 95% of nitrogen gas and 5% of chlorine.