NOVEL METHOD FOR CONFORMAL PLASMA IMMERSED ION IMPLANTATION ASSISTED BY ATOMIC LAYER DEPOSITION

摘要

embodiments of the present invention to form a conformal doped layer on the surface of the substrate which provides a novel apparatus and method . And a substrate provided in the process chamber , a layer of dopant source material is deposited by plasma deposition , atomic layer deposition , or plasma-assisted atomic layer deposition . Then haejyeoseo line on the substrate thermal process activates the dopant diffuses into the substrate surface . ;