A LITHOGRAPHY MODEL FOR 3Ｄ RESIST PROFILE SIMULATIONS

摘要

Disclosed herein is a method for simulating a three-dimensional spatial intensity distribution of radiation formed in a resist layer on a substrate resulting from incident radiation, the method comprising: directing the front propagation radiation in the resist layer and the back propagation Calculating a non-coherent sum of the radiation, calculating interference of the front propagation radiation in the resist layer and the back propagation radiation in the resist layer, and calculating the interference of the radiation from the non- And calculating a spatial intensity distribution.