首页>
外国专利>
Lithography model for 3D resist profile simulations
Lithography model for 3D resist profile simulations
展开▼
机译:用于3D抗蚀剂轮廓模拟的光刻模型
展开▼
页面导航
摘要
著录项
相似文献
摘要
Described herein is a method for simulating a three-dimensional spatial intensity distribution of radiation formed within a resist layer on a substrate resulting from an incident radiation, the method comprising: calculating an incoherent sum of forward propagating radiation in the resist layer and backward propagating radiation in the resist layer; calculating an interference of the forward propagating radiation in the resist layer and the backward propagating radiation in the resist layer; and calculating the three-dimensional spatial intensity distribution of radiation from the incoherent sum and the interference.
展开▼