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A Simple Technique for Modifying the Profile of Resist Exposed by Holographic Lithography

机译：一种改进全息光刻曝光抗蚀剂轮廓的简易技术

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Efremow, N. N.; Economou, N. P.; Kezjian, K.; Dana, S. S.; Smith, H. I.;
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年度 1981
页码 p.1-7
总页数 7
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Holography; Lithography; Profiles; Helium cadmium lasers; Substrates; Silicon dioxide; Silicon; Optical properties; Reprints; Etching;

机译：全息术;光刻;轮廓;氦镉激光器;基板;二氧化硅;硅;光学特性;重印;蚀刻;

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4. Vertical lithography: controlling resist profiles in optical lithography with a large area electron beam [C] . William R. Livesay, Electron Vision Corp., San Diego, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV . 1994

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8. A Simple Technique for Modifying the Profile of Resist Exposed by Holographic Lithography. [R] . Efremow, N. N., Economou, N. P., Kezjian, K., 1981

机译：一种改进全息光刻曝光抗蚀剂轮廓的简易技术。

A Simple Technique for Modifying the Profile of Resist Exposed by Holographic Lithography

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