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A LITHOGRAPHY MODEL FOR 3D RESIST PROFILE SIMULATIONS.
A LITHOGRAPHY MODEL FOR 3D RESIST PROFILE SIMULATIONS.
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机译:用于3D抵抗剖面模拟的光刻模型。
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摘要
Described herein is a method for simulating a three-dimensional spatial intensity distribution of radiation formed within a resist layer on a substrate resulting from an incident radiation, the method comprising: calculating an incoherent sum of forward propagating radiation in the resist layer and backward propagating radiation in the resist layer; calculating an interference of the forward propagating radiation in the resist layer and the backward propagating radiation in the resist layer; and calculating the three-dimensional spatial intensity distribution of radiation from the incoherent sum and the interference.
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