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WAFER SUPPORT AND MANUFACTURING DEVICE OF SiC EPITAXIAL WAFER INCLUDING THE SAME, AND MANUFACTURING METHOD OF SiC EPITAXIAL WAFER
WAFER SUPPORT AND MANUFACTURING DEVICE OF SiC EPITAXIAL WAFER INCLUDING THE SAME, AND MANUFACTURING METHOD OF SiC EPITAXIAL WAFER
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机译:包括其在内的SiC外延晶片的晶片支撑和制造装置以及SiC外延晶片的制造方法
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摘要
PROBLEM TO BE SOLVED: To provide a wafer support, a manufacturing device, and a manufacturing method, capable of efficiently and sufficiently reducing epitaxial crowning and also capable of making a carrier concentration in a wafer surface uniform.;SOLUTION: A wafer support of the present invention is a wafer support used in a chemical vapor deposition device that grows an epitaxial film on a principal surface of a wafer by a chemical vapor deposition method. The wafer support has: a wafer-mounting surface on the top face of which a substrate is mounted; and a wafer-supporting part that rises up so as to surround the periphery of a wafer to be mounted. The height from a portion farthest from the wafer-mounting surface on the top surface of the wafer-support part on a reaction space side to the principal surface of the wafer mounted on the wafer-mounting surface is 1 mm or more. At least a part of the wafer-support part is formed of a material containing a part of constituent elements of the epitaxial film.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2016,JPO&INPIT
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