PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK BLANK, PHOTOMASK INTERMEDIATE, PHOTOMASK, AND MANUFACTURING METHOD OF DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photomask blank that can control transmissivity of a translucent part within an allowable variation range in all areas within a transfer region when it is formed into a photomask and makes it possible to guarantee transmissivity accuracy in the transfer region.;SOLUTION: A translucent film for forming a translucent part of a pattern for transfer including the translucent part and a light-transmitting part is deposited on a main surface of a transparent substrate. The transparent substrate has an end surface perpendicular to the main surface and a corner surface contacting the main surface and the end surface severally. On the main surface, a region having the width of W(mm) from a boundary line between the main surface and the corner surface is a non film-forming region where the translucent film is not formed, the non film-forming region is formed along at least 80% or more of an outer periphery of the main surface, and fulfills 0W≤2.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2016,JPO&INPIT