PHOTOMASK BLANK HOUSING CONTAINER, METHOD FOR HOUSING PHOTOMASK BLANK, METHOD FOR STORING PHOTOMASK BLANK, METHOD FOR TRANSPORTING PHOTOMASK BLANK, AND METHOD FOR MANUFACTURING PHOTOMASK

摘要

PPROBLEM TO BE SOLVED: To provide a photomask blank housing container which can suppress both of changes in the sensitivity of a resist film by gas contamination of a housed photomask blank and contamination by dust and which facilitates storage and transportation. PSOLUTION: The container for housing a photomask blank having a resist film formed thereon comprises at least a container body, a cover, a substrate presser, and an organic gas adsorbent and/or a basic gas adsorbent. The substrate presser dynamically presses and fixes a housed photomask blank by pressure of the cover when an opening of the container body is closed by the cover, and also fixes the organic gas adsorbent and/or the basic gas adsorbent. PCOPYRIGHT: (C)2006,JPO&NCIPI