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Calculation of optical band gap of the semiconductor material method and calculation device

机译:半导体材料的光学带隙的计算方法及计算装置

摘要

PROBLEM TO BE SOLVED: To provide a calculation method and a calculation device of optical band gap in a semiconductor material capable of properly calculating a band gap using a curve on a Tauc plot created based on a measurement data such as absorption spectrum.;SOLUTION: The calculation method and the calculation device of an optical band gap in a semiconductor material includes: a primary derivation value calculation step using an energy value X0 at which the value of the Tauc plot is the maximum; an approximation line calculation step in which an approximation line is calculated using Tauc plot points existing between two points as the object with respect to every sets of two points which are separated away from each other larger than a predetermined plot number in a predetermined energy range including X0, and inclination thereof is calculated; and a band gap determination step in which an energy value at an intersection point between the approximation line having maximum inclination in the approximation line calculated in the approximation line calculation step and the baseline of the Tauc plot as an optical band gap.;COPYRIGHT: (C)2014,JPO&INPIT
机译:要解决的问题:提供一种能够使用基于吸收光谱等测量数据而创建的Tauc图上的曲线来正确计算带隙的半导体材料中的光学带隙的计算方法和计算装置;解决方案:半导体材料中的光学带隙的计算方法和计算装置包括:使用Tauc图的值最大的能量值X0进行一次微分值计算步骤;近似线计算步骤,其中相对于彼此分开的两点以上的每组,在预定的能量范围内,以大于预定图数的两点的每组为对象,使用存在于两点之间的陶克图点来计算近似线。 X0,并计算其倾角;带隙确定步骤,其中在近似线计算步骤中计算出的近似线中具有最大倾斜度的近似线与Tauc图的基线之间的交点处的能量值作为光学带隙。 C)2014,日本特许厅&INPIT

著录项

  • 公开/公告号JP5949567B2

    专利类型

  • 公开/公告日2016-07-06

    原文格式PDF

  • 申请/专利权人 株式会社島津製作所;

    申请/专利号JP20130003084

  • 发明设计人 原田 知幸;

    申请日2013-01-11

  • 分类号H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 14:40:18

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