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Study of Band Gap Engineering In Graphene Based Electrode Materials By Density Functional Calculations: A Search For High Performance Graphene Based Devices

机译:密度函数计算基于石墨烯电极材料带隙工程的研究:一种寻找高性能石墨烯基的装置

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Band gap tailoring is done by adsorbing different metals on graphene sheet The structural (density of states, band gap), electronic (V-I characteristics) and optical properties of pure graphene and graphene adsorbed with adsorbants like stannic tetra chloride and Beryllium have been studied by first principles calculations using (B3LYP), 3-21G basis set and local density approximation (LDA) of Perdew and Wan. Properties show promising device performance within the device's current-voltage characteristics which can be applied for various optoelectronic devices and analog electronics. Lower electron-effective masses has been associated with higher mobility and therefore very careful observation and attention is to be paid in maximizing the carrier density.
机译:通过在石墨烯片上吸附不同的金属来完成带隙剪裁,通过首先研究了纯石墨烯和纯石墨烯和石墨烯的纯石墨烯和石墨烯的光学性质的结构(纯石墨烯和铍的光学性质已经研究 原理计算使用(B3LYP),3-21G基础集合和普通和WAN的局部密度近似(LDA)。 属性在设备的电流 - 电压特性内显示了有希望的设备性能,可用于各种光电器件和模拟电子设备。 较低的电子有效质量与较高的迁移率相关,因此非常仔细的观察和注意力在最大化载流子密度最大化。

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