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CHEMISTRY COMPATIBLE COATING MATERIAL FOR ADVANCED DEVICE ON-WAFER PARTICLE PERFORMANCE

机译:化学相容性涂层材料,用于高级设备晶圆上颗粒性能

摘要

A method includes feeding powder comprising a yttrium oxide into a plasma spraying system, wherein the powder comprises a majority of donut-shaped particles, each of the donut-shaped particles having a spherical body with indentations on opposite sides of the spherical body. The method further includes plasma spray coating an article to apply a ceramic coating onto the article, wherein the ceramic coating comprises the yttrium oxide, wherein the donut-shaped particles cause the ceramic coating to have an improved morphology and a decreased porosity as compared to powder particles of other shapes, wherein the improved surface morphology comprises a reduced amount of surface nodules.
机译:一种方法包括将包含氧化钇的粉末进料到等离子体喷涂系统中,其中所述粉末包含大部分的甜甜圈形颗粒,每个甜甜圈形颗粒具有球形体,所述球形体在球形体的相对侧上具有凹痕。该方法还包括等离子喷涂制品,以将陶瓷涂层施加到制品上,其中该陶瓷涂层包含氧化钇,其中与粉末相比,甜甜圈形颗粒使陶瓷涂层具有改善的形态和降低的孔隙率其他形状的颗粒,其中改善的表面形态包括减少量的表面结节。

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