CHEMICAL VAPOR DEPOSITION (CVD) SYSTEM, ARRANGEMENT OF CHEMICAL VAPOR DEPOSITION SYSTEM, AND CHEMICAL VAPOR DEPOSITION METHOD

摘要

Disclosed are a chemical vapor deposition system, a method and a system arrangement thereof. The system includes a coating chamber, a fluid injection system and a radiant heating element array. The coating chamber has an external boundary including a coating area vicinity and a connection part arranged axially around the external boundary, and is placed at a fixed and vertical position. The fluid injection system includes a fluid injection array which is prepared and arranged to inject a fluid into the coating chamber for chemical vapor deposition coating of a workpiece in a vacuum pump and the coating chamber. An array of a radiant heating element is arranged at an outside of the coating chamber, and is connected to the external boundary of the coating chamber through heat and heats a zone in the coating chamber. The method of the present invention uses the system thereof. The arrangement includes more than one chemical vapor deposition system.;COPYRIGHT KIPO 2016