首页> 外文学位 >Direct Liquid Evaporation Chemical Vapor Deposition (DLE-CVD) of Nickel, Manganese and Copper-based Thin Films for Interconnects in Three-Dimensional Microelectronic Systems

【24h】

Direct Liquid Evaporation Chemical Vapor Deposition (DLE-CVD) of Nickel, Manganese and Copper-based Thin Films for Interconnects in Three-Dimensional Microelectronic Systems

机译：直接液体蒸发化学气相沉积（DLE-CVD）镍，锰和铜基薄膜，用于三维微电子系统中的互连

获取原文

获取原文并翻译 | 示例

页面导航

著录项
相似文献
相关主题

著录项

作者
Li, Kecheng.;
展开▼
作者单位

Harvard University.;

展开▼
授予单位 Harvard University.;
学科
学位 Ph.D.
年度 2016
页码 127 p.
总页数 127
原文格式 PDF
正文语种 eng
中图分类 AAI10633030;
关键词
Atom probe; Conformal deposition; CuMn; DLE-CVD; MnNx; NiSi; Thin film;

机译：原子探针;保形沉积;CUMN;dle-cvd;MNNX;NISI;薄膜;
入库时间 2022-08-17 12:01:27

相似文献

外文文献
中文文献
专利

1. Metalorganic chemical vapor deposition of silver thin films for future interconnects by direct liquid injection system [J] . Gao L, Harter P, Linsmeier C, Materials science in semiconductor processing . 2004,第4a6期

机译：银薄膜的金属有机化学气相沉积，通过直接液体注入系统用于将来的互连
2. Direct-liquid-evaporation chemical vapor deposition of smooth, highly conformal cobalt and cobalt nitride thin films [J] . Yang Jing, Li Kecheng, Feng Jun, Journal of Materials Chemistry, C. materials for optical and electronic devices . 2015,第46期

机译：直接液体蒸发化学气相沉积法制备的光滑，高度共形的钴和氮化钴薄膜
3. Chemical Vapor Deposition of Aluminum Oxide Thin Films Using a Low-cost Direct Liquid Injection Delivery System: An Educational Laboratory Experiment [J] . Serrano Pérez Edgar, Serrano Pérez Javier, José Manuel Juárez García, World Journal of Chemical Education . 2016,第4期

机译：使用低成本直接液体注入输送系统对氧化铝薄膜进行化学气相沉积：教育实验室实验
4. CHEMICAL VAPOR DEPOSITION OF NICKEL THIN FILMS ON GLASS USING NICKEL ACETYLAC ETON ATE [C] . Jan Gesthuizen, Antonio Huerta Miguelanez, Frank Reilmann, Proceedings vol.2005-09; European Conference on Chemical Vapor Deposition(EURCVD-15); 20050905-09; Bochum(DE) . 2005

机译：镍乙酸乙交酯滴定法在玻璃上化学气相沉积镍薄膜。
5. Atomic Layer Deposition and Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Conversion to Nickel Silicide Films. [D] . Li, Zhefeng. 2011

机译：氮化镍膜的原子层沉积和直接液化化学气相沉积及其转化为硅化镍膜。
6. High Quality Graphene Thin Films Synthesized by Glow Discharge Method in A Chemical Vapor Deposition System Using Solid Carbon Source [O] . Le Wang, Jie Sun, Weiling Guo, 2020

机译：固体碳源化学气相沉积系统中辉光放电法合成的高质量石墨烯薄膜
7. Direct-Liquid-Evaporation Chemical Vapor Deposition of Nanocrystalline Cobalt Metal for Nanoscale Copper Interconnect Encapsulation [O] . -1

机译：用于纳米晶体铜互连封装的纳米晶钴金属的直接液蒸发化学气相沉积

Direct Liquid Evaporation Chemical Vapor Deposition (DLE-CVD) of Nickel, Manganese and Copper-based Thin Films for Interconnects in Three-Dimensional Microelectronic Systems

著录项

相似文献

相关主题

期刊订阅