首页> 外国专利> EVAPORATION SOURCE AND DEPOSITION APPARATUS HAVING SAME

EVAPORATION SOURCE AND DEPOSITION APPARATUS HAVING SAME

机译:蒸发源和沉积装置具有相同的

摘要

The present invention relates to an evaporation source and a deposition apparatus having the same. According to an embodiment of the present invention, the evaporation source comprises: a crucible which has a receiving space to receive an evaporation material therein; a plurality of heating parts formed on an outer side of the crucible in a longitudinal direction, heating the crucible; a first temperature control part which allows the heating parts to selectively be connected thereto, controlling a temperature of a top of an evaporation surface of the evaporation material received in the receiving space; and a second temperature control part which allows the heating parts to be selectively connected thereto, controlling a temperature of a bottom of the evaporation surface of the evaporation material received in the receiving space wherein the heating parts, which are adjacent to the evaporation surface lowered in accordance with the exhaustion of the evaporation material, are disconnected from the second temperature control part, and then is electrically connected to the first temperature control part. As such, the present invention prevents a consumption of a heat source by heating an outer side of the crucible.;COPYRIGHT KIPO 2016
机译:蒸发源和具有该蒸发源的沉积设备技术领域本发明涉及蒸发源和具有该蒸发源的沉积设备。根据本发明的一个实施例,蒸发源包括:坩埚,其具有在其中容纳蒸发材料的接收空间;以及坩埚。在坩埚的长度方向外侧形成有多个加热部,对坩埚进行加热。第一温度控制部分,其允许加热部分选择性地连接到其上,从而控制容纳在容纳空间中的蒸发材料的蒸发表面的顶部的温度;第二温度控制部分,其允许加热部分选择性地连接到其上,以控制容纳在容纳空间中的蒸发材料的蒸发表面的底部的温度,其中,与蒸发表面相邻的加热部分降低。根据蒸发材料的耗尽,将其与第二温度控制部分断开,然后电连接至第一温度控制部分。这样,本发明通过加热坩埚的外侧来防止热源的消耗。; COPYRIGHT KIPO 2016

著录项

  • 公开/公告号KR20160035364A

    专利类型

  • 公开/公告日2016-03-31

    原文格式PDF

  • 申请/专利权人 SUNIC SYSTEM. LTD.;

    申请/专利号KR20140126855

  • 发明设计人 BAE YOUNG JINKR;

    申请日2014-09-23

  • 分类号C23C14/24;

  • 国家 KR

  • 入库时间 2022-08-21 14:14:46

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